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arXiv · 1608.05488

On-chip all-dielectric fabrication-tolerant zero-index metamaterials

Shota Kita·Yang Li·Philip Muñoz·Orad Reshef·Daryl I. Vulis·Robert W. Day·Eric Mazur·Marko Lončar
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Abstract

Zero-index metamaterials (ZIMs) offer unprecedented ways to manipulate the flow of light, and are of interest for wide range of applications including optical cloaking, super-coupling, and unconventional phase-matching properties in nonlinear optics. Impedance-matched ZIMs can be obtained through a photonic Dirac-cone (PDC) dispersion induced by an accidental degeneracy of two linear bands - typically an electric monopole mode and a transverse magnetic dipole mode - at the center of the Brillouin zone. Consequently, PDC can only be achieved for a particular combination of geometric parameters of the metamaterial, and hence is sensitive to fabrication imperfections. These fabrication imperfections may limit the usefulness in practical applications. In this work we overcome this obstacle and demonstrate robust all-dielectric (AD) ZIM that supports PDC dispersion over wide parameter space. Our structure, consisting of an array of Si pillars on silica substrate, is fabricated in silicon-oninsulator (SOI) platform and operates at telecom wavelengths.

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Shota Kita, Yang Li, Philip Muñoz, Orad Reshef, Daryl I. Vulis, Robert W. Day, Eric Mazur, Marko Lončar. 2016-08-19. On-chip all-dielectric fabrication-tolerant zero-index metamaterials. https://doi.org/10.1364/oe.25.008326

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