arXiv · 1706.05127
Heterogeneous nucleation of pits via step pinning during Si(100) homoepitaxy
Abstract
Using scanning tunneling microscopy (STM), we investigate oxide-induced growth pits in Si thin films deposited by molecular beam epitaxy. In the transition temperature range from 2D adatom islanding to step-flow growth, systematic controlled air leaks into the growth chamber induce pits in the growth surface. We show that pits are also correlated with oxygen-contaminated flux from Si sublimation sources. From a thermodynamic standpoint, multilayer growth pits are unexpected in relaxed homoepitaxial growth, whereas oxidation is a known cause for step pinning, roughening, and faceting on elemental surfaces, both with and without growth flux. Not surprisingly, pits are thermodynamically metastable and heal by annealing to recover a smooth periodic step arrangement. STM reveals new details about the pits' atomistic origins and growth dynamics. We give a model for heterogeneous nucleation of pits by preferential adsorption of Å-sized oxide nuclei at intrinsic growth antiphase boundaries, and subsequent step pinning and bunching around the nuclei.
Explore related subjects
Keep this discovery
Explore connections, maps & timelines
E. N. Yitamben, R. E. Butera, B. S. Swartzentruber, R. J. Simonson, S. Misra, M. S. Carroll, E. Bussmann. 2017-06-16. Heterogeneous nucleation of pits via step pinning during Si(100) homoepitaxy. https://doi.org/10.1088/1367-2630%2Faa9397
Cite the original work for its findings. Save a collection to share your selection of sources.