arXiv · 2309.12061
A BEOL Compatible, 2-Terminals, Ferroelectric Analog Non-Volatile Memory
Abstract
A Ferroelectric Analog Non-Volatile Memory based on a WOx electrode and ferroelectric HfZrO$_4$ layer is fabricated at a low thermal budget (~375$^\circ$C), enabling BEOL processes and CMOS integration. The devices show suitable properties for integration in crossbar arrays and neural network inference: analog potentiation/depression with constant field or constant pulse width schemes, cycle to cycle and device to device variation <10%, ON/OFF ratio up to 10 and good linearity. The physical mechanisms behind the resistive switching and conduction mechanisms are discussed.
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Laura Bégon-Lours, Mattia Halter, Diana Dávila Pineda, Youri Popoff, Valeria Bragaglia, Antonio La Porta, Daniel Jubin, Jean Fompeyrine, Bert Jan Offrein. 2023-09-21. A BEOL Compatible, 2-Terminals, Ferroelectric Analog Non-Volatile Memory. https://doi.org/10.1109/edtm50988.2021.9420886
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