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arXiv · 2311.12299

Thin Film Lithium Niobate Electro-optic Isolator Fabricated by photolithography assisted chemo-mechanical etching (PLACE)

Lang Gao·Youting Liang·Lvbin Song·Difeng Yin·Jia Qi·Jinming Chen·Zhaoxiang Liu·Jianping Yu·Jian Liu·Haisu Zhang·Zhiwei Fang·Hongxin Qi·Ya Cheng
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Abstract

We report a thin-film lithium niobate electro-optic isolator fabricated by photolithography-assisted chemo-mechanical etching in this work. The device demonstrates 39.50 dB isolation when subjected to a 24 GHz microwave of 25.5 dBm on its electrodes. The measured isolation remains consistently above 30 dB within the 1510 nm to 1600 nm wavelength range. The overall device insertion loss, specifically the fiber-to-fiber insert loss, has been measured to be 2.6 dB, which is attributed to our highly efficient spot size converter and the low propagation loss observed in the fabricated waveguides.

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Lang Gao, Youting Liang, Lvbin Song, Difeng Yin, Jia Qi, Jinming Chen, Zhaoxiang Liu, Jianping Yu, Jian Liu, Haisu Zhang, Zhiwei Fang, Hongxin Qi, Ya Cheng. 2023-11-21. Thin Film Lithium Niobate Electro-optic Isolator Fabricated by photolithography assisted chemo-mechanical etching (PLACE). https://arxiv.org/abs/2311.12299

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