arXiv · 2311.16740
Quantifying the contribution of material and junction resistances in nano-networks
Abstract
Networks of nanowires and nanosheets are important for many applications in printed electronics. However, the network conductivity and mobility are usually limited by the inter-particle junction resistance, a property that is challenging to minimise because it is difficult to measure. Here, we develop a simple model for conduction in networks of 1D or 2D nanomaterials, which allows us to extract junction and nanoparticle resistances from particle-size-dependent D.C. resistivity data of conducting and semiconducting materials. We find junction resistances in porous networks to scale with nanoparticle resistivity and vary from 5 Ohm for silver nanosheets to 25 GOhm for WS2 nanosheets. Moreover, our model allows junction and nanoparticle resistances to be extracted from A.C. impedance spectra of semiconducting networks. Impedance data links the high mobility (~7 cm2/Vs) of aligned networks of electrochemically exfoliated MoS2 nanosheets to low junction resistances of ~670 kOhm. Temperature-dependent impedance measurements allow us to quantitatively differentiate intra-nanosheet phonon-limited band-like transport from inter-nanosheet hopping for the first time.
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Cian Gabbett, Adam G. Kelly, Emmet Coleman, Luke Doolan, Tian Carey, Kevin Synnatschke, Shixin Liu, Anthony Dawson, Domhnall OSuilleabhain, Jose Munuera, Eoin Caffrey, John B. Boland, Zdenek Sofer, Goutam Ghosh, Sachin Kinge, Laurens D. A. Siebbeles, Neelam Yadav, Jagdish K. Vij, Muhammad Awais Aslam, Aleksandar Matkovic, Jonathan N. Coleman. 2023-11-28. Quantifying the contribution of material and junction resistances in nano-networks. https://arxiv.org/abs/2311.16740
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