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arXiv · 2404.06084

Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO$_2$ deposition process drifts

D Boivin·R Jean-Marie-Désirée·A Najah·S Cuynet·L de Poucques
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Abstract

In this work, coupled optical and electrical discharge measurements have been implemented to investigate the plasma state of a reactive HiPIMS TiO$_2$ deposition process running at a fixed duty cycle of 2% and at a repetition rate of 1 kHz. Investigations focus on both the effect of the erosion target and substrate-holder temperature in an Ar/O$_2$ gas mixture at fixed working pressure. First, as the racetrack shape evolves with the use of the target, the deposition rate is modified, in the same way as the emission intensity measured. Second, with the heater set at 400 $^\circ$C in pure Ar, the coating appears thinner, and the optical emission spectroscopy measurement reveals the presence of oxygen atoms. Thus, the results from the coupled optical and electrical measurements are sensitive enough to track potential drift of the process.

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D Boivin, R Jean-Marie-Désirée, A Najah, S Cuynet, L de Poucques. 2024-04-09. Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO$_2$ deposition process drifts. https://doi.org/10.1088/1402-4896%2Fad3302

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