Bright quantum dot light sources using monolithic microlenses on gold back-reflectors

Abstract

We present the fabrication process of bright $GaAs$ quantum dot (QD) photon sources by non-deterministic embedding into broadband monolithic $Al_{0.15}Ga_{0.85}As$ microlens arrays on gold-coated substrates. Arrays of cylindrical photoresist templates, with diameters ranging from $2$ $\mu m$ to $5$ $\mu m$, are thermally reflowed and subsequently transferred into the $Al_{0.15}Ga_{0.85}As$ thin-film semiconductor heterostructure with embedded quantum dots through an optimized anisotropic and three-dimensional shape-preserving reactive ion etching process. This methodology facilitated the fabrication of large-scale ($2$ $mm$ $\times$ $4$ $mm$) and densely packed arrays of uniformly shaped microlenses ($\sim$ $40 \times 10^3$ $mm^{-1}$), with the brightest emissions from QDs embedded in microlenses exhibiting lateral diameters and heights of $2.7$ $\mu m$ and $1.35$ $\mu m$, respectively. Finite-difference time-domain simulations of both idealized and fabricated lens shapes provide a comprehensive three-dimensional analysis of the device performance and optimization potentials such as anti-reflection coatings. It is found that free-space extraction (fiber-coupled) efficiencies of up to $62$ $\%$ ($37$ $\%$) are achievable for hemispherical QD-microlenses on gold-coated substrates. A statistical model for the fabrication yield of QD-microlenses is developed and experimentally corroborated by photoluminescence spectroscopy of fabricated microlens arrays. This analysis exhibited a free-space intensity enhancement by factors of up to $\times 200$ in approximately $1$ out of $200$ microlenses, showing good agreement to the theoretical expectations. This scalable fabrication strategy underscores the potential of these compact, high-efficiency sources offering new prospects for applications of these devices in future large-scale quantum networks.