arXiv · 2506.07545
Si Intercalation Beneath Epitaxial Graphene: Modulating Mott States at the SiC(0001) Interface
Abstract
Intercalation has proven to be a powerful tool for tailoring the electronic properties of freestanding graphene layers as well as for stabilizing the intercalated material in a two-dimensional configuration. This work examines Si intercalation of epitaxial graphene on SiC(0001) using three preparation methods. Dangling bond states at the interface were found to undergo a Mott-Hubbard metal-insulator transition as a result of a significant on-site repulsion. Comparing this heterostructure consisting of graphene and a Mott insulator with a similar system without graphene, reveals the screening ability of graphene's conduction electrons on the on-site repulsion. The system presented here can serve as a template for further research on Mott insulators with variable band gap.
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Niclas Tilgner, Zamin Mamiyev, Susanne Wolff, Philip Schädlich, Fabian Göhler, Christoph Tegenkamp, Thomas Seyller. 2025-06-09. Si Intercalation Beneath Epitaxial Graphene: Modulating Mott States at the SiC(0001) Interface. https://doi.org/10.1088/2053-1583%2Fae0f26
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