Cryogenic temperature dependence and hysteresis of surface-trap-induced gate leakage in GaN high-electron-mobility transistors

Abstract

This work provides a detailed mapping of various mechanisms of surface-trap-induced gate leakage in GaN HEMTs across a temperature range from room to cryogenic levels. Two-dimensional variable-range hopping is observed at small gate bias. Under higher reverse gate bias, the leakage is dominated by the Poole--Frenkel emission above 220 K, but gradually transitions to the trap-assisted tunneling below 220 K owing to the frozen-trap effect. The trap barrier height extracted from the gate leakage current under the upward gate sweep is 0.65 V, which is 12\% higher than that from the downward sweep. The gate leakage current as a function of the gate bias exhibits clockwise hysteresis loops above 220 K but counterclockwise ones below 220 K. This remarkable opposite hysteresis phenomenon is thoroughly explained by the trap mechanisms.