Voltage-tunable Josephson Junctions on Germanium Quantum Wells with in-situ Aluminum Contacts

Abstract

Voltage-tunable Josephson junctions (VT-JJs) are an emerging element in superconducting quantum electronics with potential to expand the functionality of conventional designs. While VT-JJs are largely compatible with wafer-scale semiconductor processing, their integration into quantum circuits remains a challenge due to unmitigated semiconductor microwave loss. Here, a deep mesa etch process, wherein the epitaxial material is removed except the VT-JJ device, will facilitate the integration of VT-JJs with low-microwave-loss circuit elements by allowing these circuit elements to be placed directly on a low-loss substrate. A Germanium quantum well is grown by Molecular Beam Epitaxy (MBE) on a float zone silicon substrate with in-situ deposited aluminum contacts. This combination allows the formation of an oxide-free superconductor-semiconductor interface. The deep mesa etch process is optimized to produce a sidewall taper sufficient for continuous metal deposition from the substrate to the top of the mesa for electrostatic gate electrodes and interconnects. The fabricated Josephson junctions demonstrate gate-tunable supercurrents with a maximum critical current over 100 nA and critical-current normal-resistance product of $8.63~\mu V$. These results demonstrate a pathway toward improved integration of voltage-tunable superconducting circuit elements with quantum electronic building blocks such as couplers and qubits.