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arXiv · 2609.24326

Amorphous insulating MoS$_x$ films deposited by magnetron sputtering as a low-index optical coating

S. G. Martanov·E. V. Tarkaeva·A. V. Muratov·A. V. Lubenchenko·O. N. Pavlov·A. G. Vitukhnovsky·A. Yu. Kuntsevich
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Abstract

While much effort are now concentrated on exploration of crystalline form of MoS$_2$ as a two-dimensional material, we show that room-temperature DC magnetron sputtering from pressurized MoS$_2$ powder target produces amorphous MoS$_x$ films with optical properties fundamentally different from those of crystalline MoS$_2$. The films were found to have a sulfur content of approximately $x=1.8$, indicating sulfur deficiency. They are optically isotropic and exhibit rather low optical losses, with a refractive index of about 2 over the visible and near-infrared spectral range. Their compatibility with lift-off lithography and dry etching makes amorphous MoS$_x$ a promising material for integrated photonic applications.

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S. G. Martanov, E. V. Tarkaeva, A. V. Muratov, A. V. Lubenchenko, O. N. Pavlov, A. G. Vitukhnovsky, A. Yu. Kuntsevich. 2026-09-21. Amorphous insulating MoS$_x$ films deposited by magnetron sputtering as a low-index optical coating. https://arxiv.org/abs/2609.24326

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