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Sub-wavelength lithography over extended areas

Gunnar Bjork·Luis L. Sanchez Soto·Jonas Soderholm
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Abstract

We demonstrate a systematic approach to sub-wavelength resolution lithographic image formation on films covering areas larger than a wavelength squared. For example, it is possible to make a lithographic pattern with a feature size resolution of $λ/[2(N+1)]$ by using a particular $2 M$-photon, multi-mode entangled state, where $N < M$, and banks of birefringent plates. By preparing a statistically mixed such a state one can form any pixel pattern on a $(N+1) 2^{M-N} \times (N+1) 2^{M-N}$ pixel grid occupying a square with a side of $L=2^{M-N-1}$ wavelengths. Hence, there is a trade-off between the exposed area, the minimum lithographic feature size resolution, and the number of photons used for the exposure. We also show that the proposed method will work even under non-ideal conditions, albeit with somewhat poorer performance.

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Gunnar Bjork, Luis L. Sanchez Soto, Jonas Soderholm. 2001-01-24. Sub-wavelength lithography over extended areas. https://doi.org/10.1103/physreva.64.013811

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