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Aly F. Elrefaie

Publications and source records attributed to Aly F. Elrefaie.

4 recordsLinked to original sources

Single Micro-hole per Pixel for Thin Ge-on-Si Image Sensor with Enhanced Sensitivity upto 1700 nm

We present a Ge-on_Si CMOS image sensor with backside illumination for the near-infrared electromagnetic waves, wavelengths range 300-1700nm, detection essential for optical sensor technology. The micro-holes help to enhance the optical efficiency and extend the range to the 1.7 microns wavelength. We demonstrate an optimization for the width and depth of the nano-holes for maximal absorption in the near infrared. We show a reduction in cross-talk by employing thin Si oxide deep trench isolation in between the pixels. Finally, we show a 26-50 percent reduction in the device capacitance with the introduction of a hole. Such CMOS-compatible Ge-on_Si sensor will enable high-density, ultra-fast and efficient near-infrared imaging.

physics.app-ph

Optimization of CMOS image sensors with single photon-trapping hole per pixel for enhanced sensitivity in near-infrared

The optimization of silicon photodiode-based CMOS sensors with backside-illumination for 300-1000 nm wavelength range was studied. It was demonstrated that a single hole on a photodiode increases the optical efficiency of the pixel in near-infrared wavelengths. A hole with optimal dimensions enhanced optical absorption by 60% for a 3 $μ$m thick Si photodiode, which is 4 orders better than that for comparable flat photodiodes. We have shown that there is an optimal size and depth of the hole that exhibits maximal absorption in blue, green, red, and infrared. Crosstalk was successfully reduced by employing thin trenches between pixels of 1.12 $μ{m^2}$ in size.

physics.optics