arXiv subjects

Gabriel Ferro

Publications and source records attributed to Gabriel Ferro.

12 recordsLinked to original sources

arXiv2025

Mechanism of Heteroepitaxial Growth of Boron Carbide on the Si-Face of 4H-SiC

Heteroepitaxial boron carbide (BxC) can be grown on Si face 4H-SiC(0001) using a two-step process involving substrate boridation at 1200$^\circ$C under BCl3 + H2 followed by a chemical vapor deposition (CVD) growth step at 1600$^\circ$C by adding C3H8 precursor. However, in-depth investigation of the early growth stages revealed that complex reactions occur before starting the CVD at high temperature. Indeed, after boridation, the 35 nm BxC buffer layer is covered by an amorphous B-containing layer which evolves and reacts during the temperature ramp up between 1200 to 1600$^\circ$C. Despite the formation of new phases (Si, SiB6), which could be explained by significant solid-state diffusion of Si, C and B elements through the thin BxC layer, the CVD epitaxial re-growth upon reaching 1600$^\circ$C does not seems to be affected by these phases. The resulting single crystalline BxC layers display the epitaxial relationships [1010]BxC(0001)||[1010]4H-SiC(0001). The layers exhibit a B4C composition, e.g. the highest possible C content for the BxC solid solution.

physics.chem-ph↗

arXiv2024

Thermochromic Properties of 3C-, 6H- and 4H-SiC Polytypes up to 500$^\circ$C

The thermochromic properties (color change with temperature) of n type doped SiC wafers of different polytypes (3C, 4H and 6H) have been investigated up to 500$^\circ$C under air. It was found that 3C-SiC color passes from bright yellow at room temperature to deep orangeat 500$^\circ$C leading to a color contrast ($\Delta$E) as high as 64. The hexagonal polytypes undergo also a color change upon heating but far less pronounced, with $\Delta$E values <20. All these semiconductors undergo band gap shrinkage upon heating which effect largely participated to the observed color change. This effect is very sensitive for 3C polytypesince its bandgap is already in the visible energy range at room temperature. The thermochromicity of 3C-SiC was found to be reversible thanks to its thermal stability and its resistance towards oxidation.

cond-mat.mtrl-sci↗

arXiv2024

Surface Structuring of Patterned 4H-SiC Surfaces Using a SiC/Si/SiC Sandwich Approach

Mesa- and trench-patterned surfaces of 4H-SiC(0001) 4{\textdegree}off wafers were structured in macrosteps using Si melting in a SiC-Si-SiC sandwich configuration. Si spreading difficulties were observed in the case of trench-patterned samples while the attempts on mesa-patterned ones were more successful. In the latter case, parallel macrosteps were formed on both the dry-etched and unetched areas though these macrosteps rarely cross the patterns edges. The proposed mechanism involved preferential etching at Si-C bilayer step edges and fast lateral propagation along the [1120] direction.

cond-mat.mtrl-sci↗

arXiv2024

Polarity Effect on the Heteroepitaxial Growth of BxC on 4H-SiC by CVD

The chemical vapor deposition (CVD) growth of boron carbide (B x C) layers on 4H-SiC, 4{\textdegree}off substrates was studied. Depending on the polarity of the substrate, different results were obtained. On Si face, the direct CVD growth at 1600{\textdegree}C under a mixture of BCl 3 +C 3 H 8 systematically led to polycrystalline B x C films, whatever the C/B ratio in the gas phase. On the C face, heteroepitaxial growth was obtained for C/B ratios = 12 or higher with a step bunched morphology. If a boridation step (10 min at 1200{\textdegree}C under BCl 3 flow) was used before the CVD growth, then heteroepitaxy was successful on both substrate polarities. To explain these results, a mechanism is proposed which involves the nature of the chemical bonds at the early stage of nucleation. It is suggested that a full B coverage of the SiC surface should favor the nucleation of the B-rich (0001) plane of B x C, promoting thus the heteroepitaxial growth along this direction.

cond-mat.mtrl-sci↗

arXiv2023

Epitaxial Growth of Boron Carbide on 4H-SiC

In this work, the successful heteroepitaxial growth of boron carbide (B x C) on 4HSiC(0001) 4{\textdegree} off substrate using chemical vapor deposition (CVD) is reported. Towards this end, a two-step procedure was developed, involving the 4H-SiC substrate boridation under BCl 3 precursor at 1200{\textdegree}C, followed by conventional CVD under BCl 3 + C 3 H 8 at 1600{\textdegree}C. Such a procedure allowed obtaining reproducibly monocrystalline (0001) oriented films of B x C with a step flow morphology at a growth rate of 1.9 $\mu$m/h. Without the boridation step, the layers are systematically polycrystalline. The study of the epitaxial growth mechanism shows that a monocrystalline B x C layer is formed after boridation but covered with a B-and Si-containing amorphous layer. Upon heating up to 1600{\textdegree}C, under pure H 2 atmosphere, the amorphous layer was converted into epitaxial B x C and transient surface SiB x and Si crystallites. These crystallites disappear upon CVD growth.

cond-mat.mtrl-sci↗

arXiv2022

Nanoscale mapping of sub-gap electroluminescence from step-bunched, oxidized 4H-SiC surfaces

Scanning tunneling luminescence microscopy (STLM) along with scanning tunneling spectroscopy (STS) is applied to a step-bunched, oxidized 4H-SiC surface prepared on the silicon face of a commercial, n-type SiC wafer using a silicon melt process. The step-bunched surface consists of atomically smooth terraces parallel to the [0001] crystal planes, and rougher risers consisting of nanoscale steps formed by the termination of these planes. The rather striking topography of this surface is well resolved with large tip biases of the order of -8 V and set currents of magnitude less than 1 nA. Hysteresis in the STS spectra is preferentially observed on the risers suggesting that they contain a higher density of surface charge traps than the terraces where hysteresis is more frequently absent. Similarly, at 50 K intense sub-gap light emission centered around 2.4 eV is observed mainly on the risers albeit only with larger tunneling currents of magnitude equal to or greater than 10 nA. These results demonstrate that STLM holds great promise for the observation of impurities and defects responsible for sub-gap light emission with spatial resolutions approaching the length scale of the defects themselves.

cond-mat.mtrl-sci↗

arXiv2016

Nanodiamond integration with photonic devices

We discuss the progress in integration of nanodiamonds with photonic devices for quantum optics applications. Experimental results in GaP, SiO2 and SiC-nanodiamond platforms show that various regimes of light and matter interaction can be achieved by engineering color center systems through hybrid approaches. We present our recent results on the growth of color center-rich nanodiamond on prefabricated 3C-SiC microdisk resonators. These hybrid devices achieve up to five-fold enhancement of diamond color center light emission and can be employed for integrated quantum photonics.

cond-mat.mes-hall↗

arXiv2015

Hybrid Group IV Nanophotonic Structures Incorporating Diamond Silicon-Vacancy Color Centers

We demonstrate a new approach for engineering group IV semiconductor-based quantum photonic structures containing negatively charged silicon-vacancy (SiV$^-$) color centers in diamond as quantum emitters. Hybrid SiC/diamond structures are realized by combining the growth of nanoand micro-diamonds on silicon carbide (3C or 4H polytype) substrates, with the subsequent use of these diamond crystals as a hard mask for pattern transfer. SiV$^-$ color centers are incorporated in diamond during its synthesis from molecular diamond seeds (diamondoids), with no need for ionimplantation or annealing. We show that the same growth technique can be used to grow a diamond layer controllably doped with SiV$^-$ on top of a high purity bulk diamond, in which we subsequently fabricate nanopillar arrays containing high quality SiV$^-$ centers. Scanning confocal photoluminescence measurements reveal optically active SiV$^-$ lines both at room temperature and low temperature (5 K) from all fabricated structures, and, in particular, very narrow linewidths and small inhomogeneous broadening of SiV$^-$ lines from all-diamond nano-pillar arrays, which is a critical requirement for quantum computation. At low temperatures (5 K) we observe in these structures the signature typical of SiV$^-$ centers in bulk diamond, consistent with a double lambda. These results indicate that high quality color centers can be incorporated into nanophotonic structures synthetically with properties equivalent to those in bulk diamond, thereby opening opportunities for applications in classical and quantum information processing.

cond-mat.mtrl-sci↗

arXiv2014

Visible Photoluminescence from Cubic (3C) Silicon Carbide Microdisks Coupled to High Quality Whispering Gallery Modes

We present the design, fabrication and characterization of cubic (3C) silicon carbide microdisk resonators with high quality factor modes at visible and near infrared wavelengths (600 - 950 nm). Whispering gallery modes with quality factors as high as 2,300 and corresponding mode volumes V ~ 2 (λ/n)^3 are measured using laser scanning confocal microscopy at room temperature. We obtain excellent correspondence between transverse-magnetic (TM) and transverse-electric (TE) polarized resonances simulated using Finite Difference Time Domain (FDTD) method and those observed in experiment. These structures based on ensembles of optically active impurities in 3C-SiC resonators could play an important role in diverse applications of nonlinear and quantum photonics, including low power optical switching and quantum memories.

physics.optics↗

arXiv2014

Ge incorporation inside 4H-SiC during Homoepitaxial growth by chemical vapor deposition

In this work, we report on the addition of GeH4 gas during homoepitaxial growth of 4H-SiC by chemical vapour deposition. Ge introduction does not affect dramatically the surface morphology and defect density though it is accompanied with Ge droplets accumulation at the surface. The Ge incorporation level inside the 4H-SiC matrix, ranging from few 1017 to few 1018 at.cm-3, was found to be mainly affected by the growth temperature and GeH4 flux. Other growth parameters like C/Si ratio, polarity, or off-orientation did not show any significant influence. On the other hand, adding GeH4 led to the increase of the intentional n type doping level by a factor of 2 to 5 depending on the C/Si ratio in the gas phase.

cond-mat.mtrl-sci↗

arXiv2013

Photonic Crystal Cavities in Cubic (3C) Polytype Silicon Carbide Films

We present the design, fabrication, and characterization of high quality factor and small mode volume planar photonic crystal cavities from cubic (3C) thin films (thickness ~ 200 nm) of silicon carbide (SiC) grown epitaxially on a silicon substrate. We demonstrate cavity resonances across the telecommunications band, with wavelengths from 1,250 - 1,600 nm. Finally, we discuss possible applications in nonlinear optics, optical interconnects, and quantum information science.

physics.optics↗

arXiv2010

Highly Confined Hybrid Spoof Surface Plasmons in Ultra-thin Metal/Dielectric Heterostructures

Highly confined "spoof" surface plasmon-like (SSP) modes are theoretically predicted to exist in a perforated metal film coated with a thin dielectric layer. Strong modes confinement results from the additional waveguiding by the layer. Spectral characteristics, field distribution, and lifetime of these SSPs are tunable by the holes' size and shape. SSPs exist both above and below the light line, offering two classes of applications: "perfect" far-field absorption and to efficient emission into guided modes. It is experimentally shown that these plasmon-like modes can turn thin, weakly-absorbing semiconductor films into perfect absorbers.

physics.optics↗