arXiv subjects

Matthew Brahlek

Publications and source records attributed to Matthew Brahlek.

81 records · Page 5Linked to original sources

arXiv2013

Conductance modulation in topological insulator Bi2Se3 thin films with ionic liquid gating

A Bi2Se3 topological insulator field effect transistor is investigated by using ionic liquid as an electric double layer gating material, leading to a conductance modulation of 365% at room temperature. We discuss the role of charged impurities on the transport properties. The conductance modulation with gate bias is due to a change in the carrier concentration, whereas the temperature dependent conductance change is originated from a change in mobility. Large conductance modulation at room temperature along with the transparent optical properties makes topological insulators as an interesting (opto)electronic material.

cond-mat.mtrl-sci↗

arXiv2013

Signature of a topological phase transition in the Josephson supercurrent through a topological insulator

Topological insulators (TIs) hold great promise for realizing zero-energy Majorana states in solid-state systems. Recently, several groups reported experimental data suggesting that signatures of Majorana modes in topological insulator Josephson junctions (TIJJs) have -- indeed -- been observed. To verify this claim, one needs to study the topological properties of low-energy Andreev-bound states (ABS) in TIs of which the Majorana modes are a special case. It has been shown theoretically that topologically non-trivial low-energy ABS are also present in TIJJs with doped topological insulators up to some critical level of doping at which the system undergoes a topological phase transition. Here, we present first experimental evidence for this topological transition in the bulk band of a doped TI. Our theoretical calculations, and numerical modeling link abrupt changes in the critical current of top-gated TIJJs to moving the chemical potential in the charge-accumulation region on the surface of the doped TI across a band-inversion point. We demonstrate that the critical-current changes originate from a shift of the spatial location of low-energy ABS from the surface to the boundary between topologically-trivial and band-inverted regions after the transition. The appearance of a decay channel for surface ABS is related to the vanishing of the band effective mass in the bulk and thus exemplifies the topological character of surface ABS as boundary modes. Importantly, the mechanism suggest a means of manipulating Majorana modes in future experiments.

cond-mat.supr-con↗

arXiv2012

Giant plateau in the THz Faraday angle in gated Bi2Se3

We report gated terahertz Faraday angle measurements on epitaxial Bi2Se3 thin films capped with In2Se3. A plateau is observed in the real part of the Faraday angle at an onset gate voltage corresponding to no band bending at the surface which persists into accumulation. The plateau is two orders of magnitude flatter than the step size expected from a single Landau Level in the low frequency limit, quantized in units of the fine structure constant. At 8 T, the plateau extends over a range of gate voltage that spans an electron density greater than 14 times the quantum flux density. Both the imaginary part of the Faraday angle and transmission measurements indicate dissipative off-axis and longitudinal conductivity channels associated with the plateau.

cond-mat.str-el↗

arXiv2012

Dirac cone shift of a passivated topological Bi2Se3 interface state

Gated terahertz cyclotron resonance measurements on epitaxial Bi2Se3 thin films capped with In2Se3 enable the first spectroscopic characterization of a single topological interface state from the vicinity of the Dirac point to above the conduction band edge. A precipitous drop in the scattering rate with Fermi energy is observed that is interpreted as the surface state decoupling from bulk states and evidence of a shift of the Dirac point towards mid-gap. Near the Dirac point, potential fluctuations of 50 meV are deduced from an observed loss of differential optical spectral weight near the Dirac point. Potential fluctuations are reduced by a factor of two at higher surface Fermi levels in the vicinity of the conduction band edge inferred from the width of the scattering rate step. The passivated topological interface state attains a high mobility of 3500 cm2/Vsec near the Dirac point.

cond-mat.mes-hall↗

arXiv2012

Topological-Metal to Band-Insulator Transition in (Bi1-xInx)2Se3 Thin Films

By combining transport and photo emission measurements on (Bi1-xInx)2Se3 thin films, we report that this system transforms from a topologically non-trivial metal into a topologically trivial band insulator through three quantum phase transitions. At x = 3-7%, there is a transition from a topologically non-trivial metal to a trivial metal. At x = 15%, the metal becomes a variable-range-hopping insulator. Finally, above x = 25%, the system becomes a true band insulator with its resistance immeasurably large even at room temperature. This material provides a new venue to investigate topologically tunable physics and devices with seamless gating/tunneling insulators.

cond-mat.mes-hall↗

arXiv2012

Thickness-independent transport channels in topological insulator Bi2Se3 thin films

With high quality topological insulator (TI) Bi2Se3 thin films, we report thickness-independent transport properties over wide thickness ranges. Conductance remained nominally constant as the sample thickness changed from 256 to ~8 QL (QL: quintuple layer, 1 QL = ~1 nm). Two surface channels of very different behaviors were identified. The sheet carrier density of one channel remained constant at ~3.0 x 10^13 cm^-2 down to 2 QL, while the other, which exhibited quantum oscillations, remained constant at ~8 x 10^12 cm^-2 only down to ~8 QL. The weak antilocalization parameters also exhibited similar thickness-independence. These two channels are most consistent with the topological surface states and the surface accumulation layers, respectively.

cond-mat.mtrl-sci↗

arXiv2011

Surface versus bulk state in topological insulator Bi2Se3 under environmental disorder

Topological insulators (TIs) are predicted to be composed of an insulating bulk state along with conducting channels on the boundary of the material. In Bi2Se3, however, the Fermi level naturally resides in the conduction band due to intrinsic doping by selenium vacancies, leading to metallic bulk states. In such non-ideal TIs it is not well understood how the surface and bulk states behave under environmental disorder. In this letter, based on transport measurements of Bi2Se3 thin films, we show that the bulk states are sensitive to environmental disorder but the surface states remain robust.

cond-mat.mtrl-sci↗

arXiv2011

Thickness-dependent bulk properties and weak anti-localization effect in topological insulator Bi2Se3

We show that a number of transport properties in topological insulator (TI) Bi2Se3 exhibit striking thickness-dependences over a range of up to five orders of thickness (3 nm - 170 μm). Volume carrier density decreased with thickness, presumably due to diffusion-limited formation of selenium vacancies. Mobility increased linearly with thickness in the thin film regime and saturated in the thick limit. The weak anti-localization effect was dominated by a single two-dimensional channel over two decades of thickness. The sublinear thickness-dependence of the phase coherence length suggests the presence of strong coupling between the surface and bulk states.

cond-mat.mtrl-sci↗

arXiv2011

Epitaxial growth of topological insulator Bi2Se3 film on Si(111) with atomically sharp interface

Atomically sharp epitaxial growth of Bi2Se3 films is achieved on Si (111) substrate with MBE (Molecular Beam Epitaxy). Two-step growth process is found to be a key to achieve interfacial-layer-free epitaxial Bi2Se3 films on Si substrates. With a single-step high temperature growth, second phase clusters are formed at an early stage. On the other hand, with low temperature growth, the film tends to be disordered even in the absence of a second phase. With a low temperature initial growth followed by a high temperature growth, second-phase-free atomically sharp interface is obtained between Bi2Se3 and Si substrate, as verified by RHEED (Reflection High Energy Electron Diffraction), TEM (Transmission Electron Microscopy) and XRD (X-Ray Diffraction). The lattice constant of Bi2Se3 is observed to relax to its bulk value during the first quintuple layer according to RHEED analysis, implying the absence of strain from the substrate. TEM shows a fully epitaxial structure of Bi2Se3 film down to the first quintuple layer without any second phase or an amorphous layer.

cond-mat.mtrl-sci↗