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arXiv · 1002.4059

Analysis of an Inverse Problem Arising in Photolithography

Luca Rondi·Fadil Santosa
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Abstract

We consider the inverse problem of determining an optical mask that produces a desired circuit pattern in photolithography. We set the problem as a shape design problem in which the unknown is a two-dimensional domain. The relationship between the target shape and the unknown is modeled through diffractive optics. We develop a variational formulation that is well-posed and propose an approximation that can be shown to have convergence properties. The approximate problem can serve as a foundation to numerical methods.

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Luca Rondi, Fadil Santosa. 2010-02-22. Analysis of an Inverse Problem Arising in Photolithography. https://doi.org/10.1142/s0218202511500266

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