arXiv · 1007.0240
Chip-scale nanofabrication of single spins and spin arrays in diamond
Abstract
We demonstrate a technique to nanofabricate nitrogen vacancy (NV) centers in diamond based on broad-beam nitrogen implantation through apertures in electron beam lithography resist. This method enables high-throughput nanofabrication of single NV centers on sub-100 nm length scales. Secondary ion mass spectroscopy (SIMS) measurements facilitate depth profiling of the implanted nitrogen to provide three-dimensional characterization of the NV center spatial distribution. Measurements of NV center coherence with on-chip coplanar waveguides suggest a pathway for incorporating this scalable nanofabrication technique in future quantum applications.
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David M. Toyli, Christoph D. Weis, Gregory D. Fuchs, Thomas Schenkel, David D. Awschalom. 2010-07-03. Chip-scale nanofabrication of single spins and spin arrays in diamond. https://doi.org/10.1021/nl102066q
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