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arXiv · 1402.3446

Polishing of {100} and {111} single crystal diamond through the use of Chemical Mechanical Polishing

Evan L. H. Thomas·Soumen Mandal·Emmanuel B. Brousseau·Oliver A. Williams
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Abstract

Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard Chemical Mechanical Polishing, as used in the silicon industry, is demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A reduction in roughness from 0.92 to 0.23 nm root mean square (RMS) and 0.31 to 0.09 nm RMS for {100} and {111} samples respectively was observed.

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Evan L. H. Thomas, Soumen Mandal, Emmanuel B. Brousseau, Oliver A. Williams. 2014-02-14. Polishing of {100} and {111} single crystal diamond through the use of Chemical Mechanical Polishing. https://doi.org/10.1088/1468-6996/15/3/035013

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