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arXiv · 1405.5395

Waveguide-mode interference lithography technique for high contrast subwavelength structures in the visible region

Kanta Kusaka·Hiroyuki Kurosawa·Seigo Ohno·Yozaburo Sakaki·Kazuyuki Nakayama·Yuto Moritake·Teruya Ishihara
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Abstract

We explore possibilities of waveguide-mode interference lithography (WMIL) technique for high contrast subwavelength structures in the visible region. Selecting an appropriate waveguide-mode, we demonstrate high contrast resist mask patterns for the first time. TM1 mode in the waveguide is shown to be useful for providing a three-dimensional structure whose cross section is checkerboard pattern. Applying our WMIL technique, we demonstrate 1D, 2D and 3D subwavelength resist patterns that are widely used for the fabrication of metamteterials in the visible region. In addition to the resist patterns, we demonstrate a resonance at 1.9 eV for a split tube structure experimentally.

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Kanta Kusaka, Hiroyuki Kurosawa, Seigo Ohno, Yozaburo Sakaki, Kazuyuki Nakayama, Yuto Moritake, Teruya Ishihara. 2014-05-21. Waveguide-mode interference lithography technique for high contrast subwavelength structures in the visible region. https://doi.org/10.1364/oe.22.018748

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