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arXiv · 1411.4505

Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes

A Dolgov·O Yakushev·A Abrikosov·E Snegirev·V M Krivtsun·C J Lee·F Bijkerk
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Abstract

An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed.

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A Dolgov, O Yakushev, A Abrikosov, E Snegirev, V M Krivtsun, C J Lee, F Bijkerk. 2014-11-17. Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes. https://doi.org/10.1088/0963-0252%2F24%2F3%2F035003

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