Investigation of superconducting properties of NbN films deposited by DC magnetron sputtering on high-k dielectric HfO2 buffer layer

N. V. Porokhov; A. P. Sirotina; E. A. Pershina; M. V. Shibalov; G. D. Diudbin; A. V. Mumlyakov; E. R. Timofeeva; I. V. Trofimov; A. M. Tagachenkov; Yu. V. Anufriev; E. V. Zenova; M. A. Tarkhov

doi:10.1088/1361-6668/ac216a

arXiv · 2106.15680

Investigation of superconducting properties of NbN films deposited by DC magnetron sputtering on high-k dielectric HfO2 buffer layer

N. V. Porokhov·A. P. Sirotina·E. A. Pershina·M. V. Shibalov·G. D. Diudbin·A. V. Mumlyakov·E. R. Timofeeva·I. V. Trofimov·A. M. Tagachenkov·Yu. V. Anufriev·E. V. Zenova·M. A. Tarkhov

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Abstract

The influence of the buffer layer of hafnia dielectric on superconducting properties of niobium nitride films, produced by the technique of the reactive magnetron depositing has been investigated for the first time. This study presents a comprehensive analysis of morphological, microstructural, and electrophysical parameters of thin NbN films.

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N. V. Porokhov, A. P. Sirotina, E. A. Pershina, M. V. Shibalov, G. D. Diudbin, A. V. Mumlyakov, E. R. Timofeeva, I. V. Trofimov, A. M. Tagachenkov, Yu. V. Anufriev, E. V. Zenova, M. A. Tarkhov. 2021-06-29. Investigation of superconducting properties of NbN films deposited by DC magnetron sputtering on high-k dielectric HfO2 buffer layer. https://doi.org/10.1088/1361-6668/ac216a

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