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arXiv · 2112.11753

Understanding Hot Carrier Reliability in FinFET Technology from Trap-based Approach

Runsheng Wang·Zixuan Sun·Yue-Yang Liu·Zhuoqing Yu·Zirui Wang·Xiangwei Jiang·Ru Huang
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Abstract

In this paper, the recent advances of our studies on hot carrier degradation (HCD) are presented from trap-based approach. The microscopic speculation of interface trap generation is carried out by time-dependent DFT (TDDFT) simulation in "real-time". Two types of oxide traps contributing to HCD are identified from experiments. Combining the contributions of interface and oxide traps, a unified compact model has been proposed which can accurately predict hot carrier degradation and variation in full Vgs/Vds bias. The trap locations, degradation contributions and temperature dependence are studied in detail. In addition, the mixed mode reliability of HCD-BTI coupling through self-heating and under off-state stress are discussed.

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Runsheng Wang, Zixuan Sun, Yue-Yang Liu, Zhuoqing Yu, Zirui Wang, Xiangwei Jiang, Ru Huang. 2021-12-22. Understanding Hot Carrier Reliability in FinFET Technology from Trap-based Approach. https://arxiv.org/abs/2112.11753

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