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arXiv · 2407.07783

Multiparameter admittance spectroscopy for investigating defects in MoS${_2}$ thin film MOSFETs

Eros Reato·Ardeshir Esteki·Benny Ku·Zhenxing Wang·Michael Heuken·Max C. Lemme·Olof Engström
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Abstract

A method for assessing the quality of electronic material properties of thin-film metal oxide semiconductor field-effect transistors (MOSFETs) is presented. By investigating samples with MOCVD-grown MoS${_2}$ channels exposed to atmospheric conditions, the existence of electron traps in MoS${_2}$ and at the interface between the gate insulator and the thin-film MoS${_2}$ are revealed. Differential conductance and capacitance data of the transistor channels are plotted as 3D surfaces on a base plane spanned by the measurement frequency versus the gate voltage. The existence of defects is confirmed by comparison with ideal results from a theoretical model.

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Eros Reato, Ardeshir Esteki, Benny Ku, Zhenxing Wang, Michael Heuken, Max C. Lemme, Olof Engström. 2024-07-10. Multiparameter admittance spectroscopy for investigating defects in MoS${_2}$ thin film MOSFETs. https://doi.org/10.1109/ted.2025.3527413

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