arXiv · 2410.19545
Time Dependent Dielectric Breakdown in 4H-SiC power MOSFETs under positive and negative gate-bias and gate-current stresses at 200{\deg}C
Abstract
The gate oxide lifetime in 4H-SiC power MOSFETs is typically assessed at fixed and constant gate bias stress, monitoring the time-dependent dielectric breakdown (TDDB).
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P. Fiorenza, F. Cordiano, S. M. Alessandrino, A. Russo, E. Zanetti, M. Saggio, C. Bongiorno, F. Giannazzo, F. Roccaforte. 2024-10-25. Time Dependent Dielectric Breakdown in 4H-SiC power MOSFETs under positive and negative gate-bias and gate-current stresses at 200{\deg}C. https://arxiv.org/abs/2410.19545
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