arXiv · 2502.18946
High-Pressure Tuning of Electrical Transport in Freestanding Oxide Films
Abstract
Electrical transport in oxide thin films under high pressure remains largely unexplored due to the lack of a universal experimental strategy. Here we develop an approach that enables high-pressure transport measurements in freestanding oxide films by enhancing their mechanical robustness and integrating them with nanoscale high-pressure devices. As a demonstration, we investigate the resistivity of perovskite SrIrO3 films under hydrostatic pressure and uncover a pressure-driven semimetal-insulator transition near 2.5 GPa, followed by an insulator-metal transition around 9 GPa. In the monolayer limit, SrIrO3 remains insulating and robust against pressure up to 5.5 GPa. The contrasting pressure-dependent phase diagrams of three- and two-dimensional iridates reveal a strong interplay between dimensionality and hydrostatic pressure in correlated oxides. Our work establishes a general platform for exploring pressure-driven phenomena in low-dimensional quantum materials.
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Jingxin Chen, Xiang Huang, Zhihan Qiao, Jiao Li, Jiahao Xu, Haiyang Zhang, Deyang Li, Enyang Men, Hangtian Wang, Han Zhang, Jianyu Xie, Guolin Zheng, Mingliang Tian, Qun Niu, Lin Hao. 2025-02-26. High-Pressure Tuning of Electrical Transport in Freestanding Oxide Films. https://arxiv.org/abs/2502.18946
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