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Surface and interface study of pulsed-laser-deposited off-stoichiometric NiMnSb thin films on Si(100) substrate

S. Rai·M. K. Tiwari·G. S. Lodha·M. H. Modi·M. K. Chattopadhyay·S. Majumdar·S. Gardelis·Z. Viskadourakis·J. Giapintzakis·R. V. Nandedkar·S. B. Roy·P. Chaddah
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Abstract

We report a detailed study of surface and interface properties of pulsed-laser deposited NiMnSb films on Si (100) substrate as a function of film thickness. As the thickness of films is reduced below 35 nm formation of a porous layer is observed. Porosity in this layer increases with decrease in NiMnSb film thickness. These morphological changes of the ultra thin films are reflected in the interesting transport and magnetic properties of these films. On the other hand, there are no influences of compositional in-homogeneity and surface/interface roughness on the magnetic and transport properties of the films.

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S. Rai, M. K. Tiwari, G. S. Lodha, M. H. Modi, M. K. Chattopadhyay, S. Majumdar, S. Gardelis, Z. Viskadourakis, J. Giapintzakis, R. V. Nandedkar, S. B. Roy, P. Chaddah. 2005-10-13. Surface and interface study of pulsed-laser-deposited off-stoichiometric NiMnSb thin films on Si(100) substrate. https://doi.org/10.1103/physrevb.73.035417

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