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Technology for Production of Ultra-Thin Crystal Silicon Membranes

V. B. Vyssotsky·E. V. Lobko·A. S. Lobko
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Abstract

Ultra-thin crystal targets in shape of self-supporting membranes were produced for our experiments with parametric x-rays emitted by low-energy electrons. Concise description of the technology developed for production of silicon crystal membranes and the technique for the membrane thickness measurements are considered in the paper. Membrane thickness of ~0.5 micron at 1.0 mm diameter supporting by 2x2 mm silicon substrate of ~200 microns thickness is achieved. Developed technology for thin crystal membrane production can also be applied for manufacturing of various membrane-containing sensors

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V. B. Vyssotsky, E. V. Lobko, A. S. Lobko. 2005-08-12. Technology for Production of Ultra-Thin Crystal Silicon Membranes. https://arxiv.org/abs/physics/0508079

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