arXiv subjects
Publications and source records attributed to S. Burger.
A numerical investigation of a two dimensional integrated fiber grating coupler capable of exciting several LP fiber modes in both TE and TM polarization is presented. Simulation results and an assessment of the numerical complexity of the 3D, fully vectorial finite element model of the device are shown.
The prospect of realizing building blocks for long-distance quantum communication is a major driving force for the development of advanced nanophotonic devices. Significant progress has been achieved in this field with respect to the fabrication of efficient quantum-dot-based single-photon sources. More recently, even spin-photon entanglement and quantum teleportation have been demonstrated in semiconductor systems. These results are considered as crucial steps towards the realization of a quantum repeater. The related work has almost exclusively been performed on self-assembled quantum dots (QDs) and random device technology. At this point it is clear that further progress in this field towards real applications will rely crucially on deterministic device technologies which will, for instance, enable the processing of bright quantum light sources with pre-defined emission energy. Here we report on enhanced photon-extraction efficiency from monolithically integrated microlenses which are coupled deterministically to single QDs. The microlenses with diameters down to 800 nm were aligned to single QDs by in-situ electron-beam lithography using a low-temperature cathodoluminescence setup. This deterministic device technology allowed us to obtain an enhancement of photon extraction efficiency for QDs integrated into microlenses as compared to QDs in unstructured surfaces. The excellent optical quality of the structures is demonstrated by cathodoluminescence and micro-photoluminescence spectroscopy. A Hong-Ou-Mandel experiment states the emission of single indistinguishable photons.
We use a finite-element method to obtain highly converged results for a nano-optical light scattering setup with a non-periodic geometry.
An overview on recent applications of the finite-element method Maxwell-solver JCMsuite to simulation tasks in nanooptics is given. Numerical achievements in the fields of optical metamaterials, plasmonics, photonic crystal fibers, light emitting devices, solar cells, optical lithography, optical metrology, integrated optics, and photonic crystals are summarized.
Nanostructures, like periodic arrays of scatters or low-index gratings, are used to improve the light outcoupling from organic light-emitting diodes (OLED). In order to optimize geometrical and material properties of such structures, simulations of the outcoupling process are very helpful. The finite element method is best suited for an accurate discretization of the geometry and the singular-like field profile within the structured layer and the emitting layer. However, a finite element simulation of the overall OLED stack is often beyond available computer resources. The main focus of this paper is the simulation of a single dipole source embedded into a twofold infinitely periodic OLED structure. To overcome the numerical burden we apply the Floquet transform, so that the computational domain reduces to the unit cell. The relevant outcoupling data are then gained by inverse Flouqet transforming. This step requires a careful numerical treatment as reported in this paper.
A method for automatic computation of parameter derivatives of numerically computed light scattering signals is demonstrated. The finite-element based method is validated in a numerical convergence study, and it is applied to investigate the sensitivity of a scatterometric setup with respect to geometrical parameters of the scattering target. The method can significantly improve numerical performance of design optimization, parameter reconstruction, sensitivity analysis, and other applications.
We show that using coherent, spatially resolved spectroscopy, complex hybrid wave functions can be disentangled into the individual wave functions of the individual emitters. This way, detailed information on the coupling of the individual emitters, not available in far-field spectroscopy can be obtained. The proposed quantum state tomography relies on the ability to selectively excite each emitter individually by spatially localized pulses. Simulations of coupled semiconductor Ga/InAs quantum dots, using light fields available in current nanoplasmonics, show that even undesired resonances can be removed from measured spectra. The method can also be applied to study the internal coupling of pigments in photosythesis and artificial light harvesting.
The influence of edge roughness in angle resolved scatterometry at periodically structured surfaces is investigated. A good description of the radiation interaction with structured surfaces is crucial for the understanding of optical imaging processes like, e.g. in photolithography. We compared an analytical 2D model and a numerical 3D simulation with respect to the characterization of 2D diffraction of a line grating involving structure roughness. The results show a remarkably high agreement. The diffraction intensities of a rough structure can therefore be estimated using the numerical simulation result of an undisturbed structure and an analytically derived correction function. This work allows to improve scatterometric results for the case of practically relevant 2D structures.
We present a finite element method (FEM) solver for computation of optical resonance modes in VCSELs. We perform a convergence study and demonstrate that high accuracies for 3D setups can be attained on standard computers. We also demonstrate simulations of thermo-optical effects in VCSELs.
EUV scatterometry is performed on 3D patterns on EUV lithography masks. Numerical simulations of the experimental setup are performed using a rigorous Maxwell solver. Mask geometry is determined by minimizing the difference between experimental results and numerical results for varied geometrical input parameters for the simulations.
Simulations of light scattering off an extreme ultraviolet lithography mask with a 2D-periodic absorber pattern are presented. In a detailed convergence study it is shown that accurate results can be attained for relatively large 3D computational domains and in the presence of sidewall-angles and corner-roundings.
High-Q optical resonances in photonic microcavities are investigated numerically using a time-harmonic finite-element method.
In the present article we investigate optical near fields in semiconductor lasers. We perform finite element simulations for two different laser types, namely a super large optical waveguide (SLOW) laser, which is an edge emitter, and a vertical cavity surface emitting laser (VCSEL). We give the mathematical formulation of the different eigenvalue problems that arise for our examples and explain their numerical solution with the finite element method. Thereby, we also comment on the usage of transparent boundary conditions, which have to be applied to respect the exterior environment, e.g., the very large substrate and surrounding air. For the SLOW laser we compare the computed near fields to experimental data for different design parameters of the device. For the VCSEL example a comparison to simplified 1D mode calculations is carried out.
Image modeling and simulation are critical to extending the limits of leading edge lithography technologies used for IC making. Simultaneous source mask optimization (SMO) has become an important objective in the field of computational lithography. SMO is considered essential to extending immersion lithography beyond the 45nm node. However, SMO is computationally extremely challenging and time-consuming. The key challenges are due to run time vs. accuracy tradeoffs of the imaging models used for the computational lithography. We present a new technique to be incorporated in the SMO flow. This new approach is based on the reduced basis method (RBM) applied to the simulation of light transmission through the lithography masks. It provides a rigorous approximation to the exact lithographical problem, based on fully vectorial Maxwell's equations. Using the reduced basis method, the optimization process is divided into an offline and an online steps. In the offline step, a RBM model with variable geometrical parameters is built self-adaptively and using a Finite Element (FEM) based solver. In the online step, the RBM model can be solved very fast for arbitrary illumination and geometrical parameters, such as dimensions of OPC features, line widths, etc. This approach dramatically reduces computational costs of the optimization procedure while providing accuracy superior to the approaches involving simplified mask models. RBM furthermore provides rigorous error estimators, which assure the quality and reliability of the reduced basis solutions. We apply the reduced basis method to a 3D SMO example. We quantify performance, computational costs and accuracy of our method.
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) novel reflective masks have to be used in the production process. A prerequisite to meet the high quality requirements for these EUV masks is a simple and accurate method for absorber pattern profile characterization. In our previous work we demonstrated that the Finite Element Method (FEM) is very well suited for the simulation of EUV scatterometry and can be used to reconstruct EUV mask profiles from experimental scatterometric data. In this contribution we apply an indirect metrology method to periodic EUV line masks with different critical dimensions (140 nm and 540 nm) over a large range of duty cycles (1:2, ..., 1:20). We quantitatively compare the reconstructed absorber pattern parameters to values obtained from direct AFM and CD-SEM measurements. We analyze the reliability of the reconstruction for the given experimental data. For the CD of the absorber lines, the comparison shows agreement of the order of 1nm. Furthermore we discuss special numerical techniques like domain decomposition algorithms and high order finite elements and their importance for fast and accurate solution of the inverse problem.
A bottleneck for computational lithography and optical metrology are long computational times for near field simulations. For design, optimization, and inverse scatterometry usually the same basic layout has to be simulated multiple times for different values of geometrical parameters. The reduced basis method allows to split up the solution process of a parameterized model into an expensive offline and a cheap online part. After constructing the reduced basis offline, the reduced model can be solved online very fast in the order of seconds or below. Error estimators assure the reliability of the reduced basis solution and are used for self adaptive construction of the reduced system. We explain the idea of reduced basis and use the finite element solver JCMsuite constructing the reduced basis system. We present a 3D optimization application from optical proximity correction (OPC).
Optical properties of hybrid plasmonic waveguides and of low-Q cavities, formed by waveguides of finite length are investigated numerically. These structures are of interest as building-blocks of plasmon lasers. We use a time-harmonic finite-element package including a propagation-mode solver, a resonance-mode solver and a scattering solver for studying various properties of the system. Numerical convergence of all used methods is demonstrated.
Optical resonances in 1D photonic crystal microcavities are investigated numerically using finite-element light scattering and eigenmode solvers. The results are validated by comparison to experimental and theoretical findings from the literature. The influence of nanometer-scale geometry variations on the resonator performance is studied. Limiting factors to ultra-high Q-factor performance are identified.