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Zhaoxiang Liu

Publications and source records attributed to Zhaoxiang Liu.

At least 55 records · Page 3Linked to original sources

A Multimodal Benchmark Dataset and Model for Crop Disease Diagnosis

While conversational generative AI has shown considerable potential in enhancing decision-making for agricultural professionals, its exploration has predominantly been anchored in text-based interactions. The evolution of multimodal conversational AI, leveraging vast amounts of image-text data from diverse sources, marks a significant stride forward. However, the application of such advanced vision-language models in the agricultural domain, particularly for crop disease diagnosis, remains underexplored. In this work, we present the crop disease domain multimodal (CDDM) dataset, a pioneering resource designed to advance the field of agricultural research through the application of multimodal learning techniques. The dataset comprises 137,000 images of various crop diseases, accompanied by 1 million question-answer pairs that span a broad spectrum of agricultural knowledge, from disease identification to management practices. By integrating visual and textual data, CDDM facilitates the development of sophisticated question-answering systems capable of providing precise, useful advice to farmers and agricultural professionals. We demonstrate the utility of the dataset by finetuning state-of-the-art multimodal models, showcasing significant improvements in crop disease diagnosis. Specifically, we employed a novel finetuning strategy that utilizes low-rank adaptation (LoRA) to finetune the visual encoder, adapter and language model simultaneously. Our contributions include not only the dataset but also a finetuning strategy and a benchmark to stimulate further research in agricultural technology, aiming to bridge the gap between advanced AI techniques and practical agricultural applications. The dataset is available at https: //github.com/UnicomAI/UnicomBenchmark/tree/main/CDDMBench.

cs.CV↗

CHiSafetyBench: A Chinese Hierarchical Safety Benchmark for Large Language Models

With the profound development of large language models(LLMs), their safety concerns have garnered increasing attention. However, there is a scarcity of Chinese safety benchmarks for LLMs, and the existing safety taxonomies are inadequate, lacking comprehensive safety detection capabilities in authentic Chinese scenarios. In this work, we introduce CHiSafetyBench, a dedicated safety benchmark for evaluating LLMs' capabilities in identifying risky content and refusing answering risky questions in Chinese contexts. CHiSafetyBench incorporates a dataset that covers a hierarchical Chinese safety taxonomy consisting of 5 risk areas and 31 categories. This dataset comprises two types of tasks: multiple-choice questions and question-answering, evaluating LLMs from the perspectives of risk content identification and the ability to refuse answering risky questions respectively. Utilizing this benchmark, we validate the feasibility of automatic evaluation as a substitute for human evaluation and conduct comprehensive automatic safety assessments on mainstream Chinese LLMs. Our experiments reveal the varying performance of different models across various safety domains, indicating that all models possess considerable potential for improvement in Chinese safety capabilities. Our dataset is publicly available at https://github.com/UnicomAI/UnicomBenchmark/tree/main/CHiSafetyBench.

cs.CL↗

Patch-wise Auto-Encoder for Visual Anomaly Detection

Anomaly detection without priors of the anomalies is challenging. In the field of unsupervised anomaly detection, traditional auto-encoder (AE) tends to fail based on the assumption that by training only on normal images, the model will not be able to reconstruct abnormal images correctly. On the contrary, we propose a novel patch-wise auto-encoder (Patch AE) framework, which aims at enhancing the reconstruction ability of AE to anomalies instead of weakening it. Each patch of image is reconstructed by corresponding spatially distributed feature vector of the learned feature representation, i.e., patch-wise reconstruction, which ensures anomaly-sensitivity of AE. Our method is simple and efficient. It advances the state-of-the-art performances on Mvtec AD benchmark, which proves the effectiveness of our model. It shows great potential in practical industrial application scenarios.

cs.CV↗

TP3M: Transformer-based Pseudo 3D Image Matching with Reference Image

Image matching is still challenging in such scenes with large viewpoints or illumination changes or with low textures. In this paper, we propose a Transformer-based pseudo 3D image matching method. It upgrades the 2D features extracted from the source image to 3D features with the help of a reference image and matches to the 2D features extracted from the destination image by the coarse-to-fine 3D matching. Our key discovery is that by introducing the reference image, the source image's fine points are screened and furtherly their feature descriptors are enriched from 2D to 3D, which improves the match performance with the destination image. Experimental results on multiple datasets show that the proposed method achieves the state-of-the-art on the tasks of homography estimation, pose estimation and visual localization especially in challenging scenes.

cs.CV↗

Piculet: Specialized Models-Guided Hallucination Decrease for MultiModal Large Language Models

Multimodal Large Language Models (MLLMs) have made significant progress in bridging the gap between visual and language modalities. However, hallucinations in MLLMs, where the generated text does not align with image content, continue to be a major challenge. Existing methods for addressing hallucinations often rely on instruction-tuning, which requires retraining the model with specific data, which increases the cost of utilizing MLLMs further. In this paper, we introduce a novel training-free method, named Piculet, for enhancing the input representation of MLLMs. Piculet leverages multiple specialized models to extract descriptions of visual information from the input image and combine these descriptions with the original image and query as input to the MLLM. We evaluate our method both quantitively and qualitatively, and the results demonstrate that Piculet greatly decreases hallucinations of MLLMs. Our method can be easily extended to different MLLMs while being universal.

cs.AI↗

Methodology of Adapting Large English Language Models for Specific Cultural Contexts

The rapid growth of large language models(LLMs) has emerged as a prominent trend in the field of artificial intelligence. However, current state-of-the-art LLMs are predominantly based on English. They encounter limitations when directly applied to tasks in specific cultural domains, due to deficiencies in domain-specific knowledge and misunderstandings caused by differences in cultural values. To address this challenge, our paper proposes a rapid adaptation method for large models in specific cultural contexts, which leverages instruction-tuning based on specific cultural knowledge and safety values data. Taking Chinese as the specific cultural context and utilizing the LLaMA3-8B as the experimental English LLM, the evaluation results demonstrate that the adapted LLM significantly enhances its capabilities in domain-specific knowledge and adaptability to safety values, while maintaining its original expertise advantages.

cs.CL↗

What is the best model? Application-driven Evaluation for Large Language Models

General large language models enhanced with supervised fine-tuning and reinforcement learning from human feedback are increasingly popular in academia and industry as they generalize foundation models to various practical tasks in a prompt manner. To assist users in selecting the best model in practical application scenarios, i.e., choosing the model that meets the application requirements while minimizing cost, we introduce A-Eval, an application-driven LLMs evaluation benchmark for general large language models. First, we categorize evaluation tasks into five main categories and 27 sub-categories from a practical application perspective. Next, we construct a dataset comprising 678 question-and-answer pairs through a process of collecting, annotating, and reviewing. Then, we design an objective and effective evaluation method and evaluate a series of LLMs of different scales on A-Eval. Finally, we reveal interesting laws regarding model scale and task difficulty level and propose a feasible method for selecting the best model. Through A-Eval, we provide clear empirical and engineer guidance for selecting the best model, reducing barriers to selecting and using LLMs and promoting their application and development. Our benchmark is publicly available at https://github.com/UnicomAI/DataSet/tree/main/TestData/GeneralAbility.

cs.CL↗

Compact low-half-wave-voltage thin film lithium niobate electro-optic phase modulator fabricated by photolithography assisted chemo-mechanical etching

This paper presents a compact dual-arm thin film lithium niobate (TFLN) electro-optic phase modulator fabricated using the photolithography-assisted chemo-mechanical etching (PLACE) technique. The design of the device allows for complete utilization of the microwave electric field, doubling the modulation efficiency compared to single-arm modulators in theory. With a half-wave voltage of approximately 3 V and a modulation length of 1 cm, the device outperforms conventional phase modulators. Furthermore, the phase modulator exhibits low sensitivity to optical wavelengths in the range of 1510-1600 nm and offers a low insertion loss of 2.8 dB. The capability to generate multiple sideband signals for optical frequency comb applications is also demonstrated, producing 29 sideband signals at an input microwave power of 2 W.

physics.optics↗

An erbium-doped waveguide amplifier on thin film lithium niobate with an output power exceeding 100 mW

We demonstrate high-power thin film lithium niobate (TFLN) erbium-doped waveguide amplifier (EDWA) with a maximum on-chip output power of 113 mW and a gain of 16 dB. The on-chip integrated EDWA is composed of large mode area (LMA) waveguide structures with a total length of 7 cm and a footprint of 1x1 cm2. Particularly, we connect segmented LMA waveguides with waveguide tapers to achieve on-chip mode conversion which maintains single-mode propagation all over the EDWA even at the waveguide bends. The design leads to significant increase of the amplified signal power by orders of magnitude and will open an avenue for applications such as on-chip high-power lasers and amplifiers system.

physics.optics↗

On-chip wavelength division multiplexing by angled multimode interferometer fabricated on erbium-doped thin film lithium niobate on insulator

Photonic integrated circuits based on erbium doped thin film lithium niobate on insulator has attracted broad interests with insofar various waveguide amplifiers and microlasers demonstrated. Wideband operation facilitated by the broadband absorption and emission of erbium ions necessitates the functional integration of wavelength filter and multiplexer on the same chip. Here a low-loss wavelength division multiplexer at the resonant pumping and emission wavelengths (~1480 nm and 1530~1560 nm) of erbium ions based on angled multimode interferometer, is realized in the erbium doped thin film lithium niobate on insulator fabricated by the photolithography assisted chemomechanical etching technique. The minimum on-chip insertion losses of the fabricated device are <0.7 dB for both wavelength ranges, and a 3-dB bandwidth of >20 nm is measured at the telecom C-band. Besides, direct visualization of the multimode interference pattern by the visible upconversion fluorescence of erbium ions compares well with the simulated light propagation in the multimode interferometer. Spectral tuning of the wavelength division multiplexer by structural design is also demonstrated and discussed.

physics.optics↗

Thin Film Lithium Niobate Electro-optic Isolator Fabricated by photolithography assisted chemo-mechanical etching (PLACE)

We report a thin-film lithium niobate electro-optic isolator fabricated by photolithography-assisted chemo-mechanical etching in this work. The device demonstrates 39.50 dB isolation when subjected to a 24 GHz microwave of 25.5 dBm on its electrodes. The measured isolation remains consistently above 30 dB within the 1510 nm to 1600 nm wavelength range. The overall device insertion loss, specifically the fiber-to-fiber insert loss, has been measured to be 2.6 dB, which is attributed to our highly efficient spot size converter and the low propagation loss observed in the fabricated waveguides.

physics.optics↗

On-chip coherent beam combination of waveguide amplifiers on Er$^{3+}$-doped thin film lithium niobate

We demonstrate on-chip coherent beam combination of two waveguide amplifiers on Er$^{3+}$-doped thin film lithium niobate (Er: TFLN) platform. Our device is built based on an electro-optic modulator fabricated on Er: TFLN. The output power of the coherently combined amplifiers is measured as high as 12.9 mW, surpassing that of previous single waveguide amplifiers based on Er$^{3+}$-doped thin film lithium niobate platform.

physics.optics↗

Semi-supervised Object Detection: A Survey on Recent Research and Progress

In recent years, deep learning technology has been maturely applied in the field of object detection, and most algorithms tend to be supervised learning. However, a large amount of labeled data requires high costs of human resources, which brings about low efficiency and limitations. Semi-supervised object detection (SSOD) has been paid more and more attentions due to its high research value and practicability. It is designed to learn information by using small amounts of labeled data and large amounts of unlabeled data. In this paper, we present a comprehensive and up-to-date survey on the SSOD approaches from five aspects. We first briefly introduce several ways of data augmentation. Then, we dive the mainstream semi-supervised strategies into pseudo labels, consistent regularization, graph based and transfer learning based methods, and introduce some methods in challenging settings. We further present widely-used loss functions, and then we outline the common benchmark datasets and compare the accuracy among different representative approaches. Finally, we conclude this paper and present some promising research directions for the future. Our survey aims to provide researchers and practitioners new to the field as well as more advanced readers with a solid understanding of the main approaches developed over the past few years.

cs.CV↗

A Survey on Unsupervised Anomaly Detection Algorithms for Industrial Images

In line with the development of Industry 4.0, surface defect detection/anomaly detection becomes a topical subject in the industry field. Improving efficiency as well as saving labor costs has steadily become a matter of great concern in practice, where deep learning-based algorithms perform better than traditional vision inspection methods in recent years. While existing deep learning-based algorithms are biased towards supervised learning, which not only necessitates a huge amount of labeled data and human labor, but also brings about inefficiency and limitations. In contrast, recent research shows that unsupervised learning has great potential in tackling the above disadvantages for visual industrial anomaly detection. In this survey, we summarize current challenges and provide a thorough overview of recently proposed unsupervised algorithms for visual industrial anomaly detection covering five categories, whose innovation points and frameworks are described in detail. Meanwhile, publicly available datasets for industrial anomaly detection are introduced. By comparing different classes of methods, the advantages and disadvantages of anomaly detection algorithms are summarized. Based on the current research framework, we point out the core issue that remains to be resolved and provide further improvement directions. Meanwhile, based on the latest technological trends, we offer insights into future research directions. It is expected to assist both the research community and industry in developing a broader and cross-domain perspective.

cs.CV↗

On-chip arrayed waveguide grating fabricated on thin film lithium niobate

We design an on-chip 8-channel TFLN AWG and fabricate the device using photolithography assisted chemo-mechanical etching (PLACE) technique. We experimentally measure the transmission of the fabricated TFLN AWG near the central wavelength of 1550 nm. We obtain an on-chip loss as low as 3.32 dB, a single-channel bandwidth of 1.6 nm and a total-channel bandwidth of 12.8 nm. The crosstalk between adjacent channels was measured to be below -7.01 dB within the wavelength range from 1543 nm to 1558 nm, and the crosstalk between non-adjacent channels was below -15 dB.

physics.optics↗

Electro-optically programmable photonic circuits enabled by wafer-scale integration on thin-film lithium niobate

Programmable photonic circuits performing universal linear-optical transformations underpin vital functions in photonic quantum information processing, quantum-enhanced sensor networks, machine learning and many other intriguing applications. Recent advances in photonic integrated circuits facilitate monolithic integration of externally controlled Mach-Zehnder interferometers which can implement arbitrary unitary transformation on a large number of input/output modes. In this work, we demonstrate a 4x4 programmable linear photonic circuit on lithium niobate on insulator platform employing fast, power-efficient and low-loss electro-optical phase shifters, showing enormous advantages in terms of configuration rate and power consumption. Our device is capable of fast switching with 500 ps rise time and 1.7 ns fall time, and possesses a total on-chip power dissipation of only 0.015 mW when operated at 1 MHz modulation, and an insertion loss of 0.15 dB for each modulator and an on-chip extinction ratio of -34 dB for both cross and bar routes.

physics.optics↗

Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics

Photolithography assisted chemo-mechanical etching (PLACE), a technique specifically developed for fabricating highquality large-scale photonic integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled fabrication of a series of building blocks of PICs ranging from high-quality (high-Q) microresonators and low-loss waveguides to electrooptically (EO) tunable lasers and waveguide amplifiers. Aiming at high-throughput manufacturing of the PIC devices and systems, we have developed an ultra-high-speed high-resolution laser lithography fabrication system employing a high repetition rate femtosecond laser and a high-speed polygon laser scanner, by which a lithography fabrication efficiency of 4.8 cm2/h has been achieved at a spatial resolution of 200 nm. We demonstrate wafer-scale fabrication of TFLN-based photonic structures, optical phase masks as well as color printing

physics.optics↗

Data-Centric AI Paradigm Based on Application-Driven Fine-Grained Dataset Design

Deep learning has a wide range of applications in industrial scenario, but reducing false alarm (FA) remains a major difficulty. Optimizing network architecture or network parameters is used to tackle this challenge in academic circles, while ignoring the essential characteristics of data in application scenarios, which often results in increased FA in new scenarios. In this paper, we propose a novel paradigm for fine-grained design of datasets, driven by industrial applications. We flexibly select positive and negative sample sets according to the essential features of the data and application requirements, and add the remaining samples to the training set as uncertainty classes. We collect more than 10,000 mask-wearing recognition samples covering various application scenarios as our experimental data. Compared with the traditional data design methods, our method achieves better results and effectively reduces FA. We make all contributions available to the research community for broader use. The contributions will be available at https://github.com/huh30/OpenDatasets.

cs.CV↗