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arXiv · 1601.02669

Microfabrication of large area high-stress silicon nitride membranes for optomechanical devices

E. Serra·M. Bawaj·A. Borrielli·G. Di Giuseppe·S. Forte·N. Kralj·N. Malossi·L. Marconi·F. Marin·F. Marino·B. Morana·R. Natali·G. Pandraud·A. Pontin·G. A. Prodi·M. Rossi·P. M. Sarro·D. Vitali·M. Bonaldi
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Abstract

In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiN$_x$ membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiN$_x$ membranes were fabricated and used as optomechanical resonators in a Michelson interferometer and in a Fabry-P\'erot cavity. The measurements show that the fabrication process preserves both the optical quality and the mechanical quality factor of the membrane.

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E. Serra, M. Bawaj, A. Borrielli, G. Di Giuseppe, S. Forte, N. Kralj, N. Malossi, L. Marconi, F. Marin, F. Marino, B. Morana, R. Natali, G. Pandraud, A. Pontin, G. A. Prodi, M. Rossi, P. M. Sarro, D. Vitali, M. Bonaldi. 2015-12-21. Microfabrication of large area high-stress silicon nitride membranes for optomechanical devices. https://doi.org/10.1063/1.4953805

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