Characterization of in-gap states in epitaxial CoFe2O4(111) layers grown on Al2O3(111)/Si(111) by resonant inelastic x-ray scattering

Yuki K. Wakabayashi; Takashi Tokushima; Kentaro Kuga; Hiroshi Yomosa; Masaki Oura; Hidenori Fujiwara; Tetsuya Ishikawa; Masaaki Tanaka; Takayuki Kiss; Ryosho Nakane

arXiv · 1910.05734

Characterization of in-gap states in epitaxial CoFe2O4(111) layers grown on Al2O3(111)/Si(111) by resonant inelastic x-ray scattering

Yuki K. Wakabayashi·Takashi Tokushima·Kentaro Kuga·Hiroshi Yomosa·Masaki Oura·Hidenori Fujiwara·Tetsuya Ishikawa·Masaaki Tanaka·Takayuki Kiss·Ryosho Nakane

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Abstract

We have studied in-gap states in epitaxial CoFe2O4(111), which potentially acts as a perfect spin filter, grown on a Al2O3(111)/Si(111) structure by using ellipsometry, Fe L2,3-edge x-ray absorption spectroscopy (XAS), and Fe L2,3-edge resonant inelastic x-ray scattering (RIXS), and revealed the relation between the in-gap states and chemical defects due to the Fe2+ cations at the octahedral sites (Fe2+ (Oh) cations). The ellipsometry measurements showed the indirect band gap of 1.24 eV for the CoFe2O4 layer and the Fe L2,3-edge XAS confirmed the characteristic photon energy for the preferential excitation of the Fe2+ (Oh) cations. In the Fe L3-edge RIXS spectra, a band-gap excitation and an excitation whose energy is smaller than the band-gap energy (Eg = 1.24 eV) of CoF2O4, which we refer to as "below-band-gap excitation (BBGE)" hereafter, were observed. The intensity of the BBGE was strengthened at the preferential excitation energy of the Fe2+ (Oh) cations. In addition, the intensity of the BBGE was significantly increased when the thickness of the CoFe2O4 layer was decreased from 11 to 1.4 nm, which coincides with the increase in the site occupancy of the Fe2+ (Oh) cations with decreasing the thickness. These results indicate that the BBGE comes from the in-gap states of the Fe2+ (Oh) cations whose density increases near the heterointerface on the bottom Al2O3 layer. We have demonstrated that RIXS measurements and analyses in combination with ellipsometry and XAS are effective to provide an insight into in-gap states in thin-film oxide heterostructures.

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Yuki K. Wakabayashi, Takashi Tokushima, Kentaro Kuga, Hiroshi Yomosa, Masaki Oura, Hidenori Fujiwara, Tetsuya Ishikawa, Masaaki Tanaka, Takayuki Kiss, Ryosho Nakane. 2019-10-13. Characterization of in-gap states in epitaxial CoFe2O4(111) layers grown on Al2O3(111)/Si(111) by resonant inelastic x-ray scattering. https://arxiv.org/abs/1910.05734

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