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arXiv · 2003.00207

Cryogenic Characterization of 180 nm CMOS Technology at 100 mK

Roger Huang·Dario Gnani·Carl Grace·Yury Kolomensky·Yuan Mei·Aikaterini Papadopoulou
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Abstract

Conventional CMOS technology operated at cryogenic conditions has recently attracted interest for its uses in low-noise electronics. We present one of the first characterizations of 180 nm CMOS technology at a temperature of 100 mK, extracting I/V characteristics, threshold voltages, and transconductance values, as well as observing their temperature dependence. We find that CMOS devices remain fully operational down to these temperatures, although we observe hysteresis effects in some devices. The measurements described in this paper can be used to inform the future design of CMOS devices intended to be operated in this deep cryogenic regime.

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Roger Huang, Dario Gnani, Carl Grace, Yury Kolomensky, Yuan Mei, Aikaterini Papadopoulou. 2020-02-29. Cryogenic Characterization of 180 nm CMOS Technology at 100 mK. https://doi.org/10.1088/1748-0221/15/06/p06026

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