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arXiv · 2209.11503

Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers

Luca Forrer·Aurèle Kamber·Armin Knoll·Martino Poggio·Floris Braakman
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Abstract

We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. The process includes a floating-layer technique to coat the cantilevers in electron-beam resist. We demonstrate gate definition through a lift-off process, as well as through an etching process. The cantilevers maintain a high force sensitivity after undergoing the patterning process. Our method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors.

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Luca Forrer, Aurèle Kamber, Armin Knoll, Martino Poggio, Floris Braakman. 2022-09-23. Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers. https://arxiv.org/abs/2209.11503

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