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arXiv · 1904.00345

Thermal conductivity of crystalline AlN and the influence of atomic-scale defects

Runjie Lily Xu·Miguel Munoz Rojo·S. M. Islam·Aditya Sood·Bozo Vareskic·Ankita Katre·Natalio Mingo·Kenneth E. Goodson·Huili Grace Xing·Debdeep Jena·Eric Pop
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Abstract

Aluminum nitride (AlN) plays a key role in modern power electronics and deep-ultraviolet photonics, where an understanding of its thermal properties is essential. Here we measure the thermal conductivity of crystalline AlN by the 3${\omega}$ method, finding it ranges from 674 ${\pm}$ 56 W/m/K at 100 K to 186 ${\pm}$ 7 W/m/K at 400 K, with a value of 237 ${\pm}$ 6 W/m/K at room temperature. We compare these data with analytical models and first principles calculations, taking into account atomic-scale defects (O, Si, C impurities, and Al vacancies). We find Al vacancies play the greatest role in reducing thermal conductivity because of the largest mass-difference scattering. Modeling also reveals that 10% of heat conduction is contributed by phonons with long mean free paths, over ~7 ${\mu}$m at room temperature, and 50% by phonons with MFPs over ~0.3 ${\mu}$m. Consequently, the effective thermal conductivity of AlN is strongly reduced in sub-micron thin films or devices due to phonon-boundary scattering.

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Runjie Lily Xu, Miguel Munoz Rojo, S. M. Islam, Aditya Sood, Bozo Vareskic, Ankita Katre, Natalio Mingo, Kenneth E. Goodson, Huili Grace Xing, Debdeep Jena, Eric Pop. 2019-03-31. Thermal conductivity of crystalline AlN and the influence of atomic-scale defects. https://doi.org/10.1063/1.5097172

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