First results of the new endcap TOF commissioning at BESIII

Zhi Wu; Shengsen Sun; Yuekun Heng; Xiaozhuang Wang; Yongjie Sun; Cheng Li; Hongliang Dai; Ping Cao; Jie Zhang; Weijia Sun; Siyu Wang; Yun Wang; Xiaolu Ji; Jinzhou Zhao; Wenxuan Gong; Mei Ye; Xiaoyan Ma; Mingming Chen; Meihang Xu; Xiaolan Luo; Rongxing Yang; Qi An; Xiaoshan Jiang; Zhen-an Liu; Shubin Liu; Kejun Zhu

doi:10.1088/1748-0221/11/07/c07005

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arXiv · 1605.01780

First results of the new endcap TOF commissioning at BESIII

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Abstract

The upgrade of the current BESIII Endcap TOF (ETOF) is carried out with the Multi-gap Resistive Plate Chamber (MRPC) technology. The installation of the new ETOF has been finished in October 2015. The first results of the MRPCs commissioning at BESIII are reported in this paper.

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Zhi Wu, Shengsen Sun, Yuekun Heng, Xiaozhuang Wang, Yongjie Sun, Cheng Li, Hongliang Dai, Ping Cao, Jie Zhang, Weijia Sun, Siyu Wang, Yun Wang, Xiaolu Ji, Jinzhou Zhao, Wenxuan Gong, Mei Ye, Xiaoyan Ma, Mingming Chen, Meihang Xu, Xiaolan Luo, Rongxing Yang, Qi An, Xiaoshan Jiang, Zhen-an Liu, Shubin Liu, Kejun Zhu. 2016-05-05. First results of the new endcap TOF commissioning at BESIII. https://doi.org/10.1088/1748-0221/11/07/c07005

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