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arXiv · 2505.05867

Further Characterisation of Digital Pixel Test Structures Implemented in a 65 nm CMOS Process

Abstract

The next generation of MAPS for future tracking detectors will have to meet stringent requirements placed on them. One such detector is the ALICE ITS3 that aims to be very light at 0.07% X/X$_{0}$ per layer and have a low power consumption in the active area of 40 mW/cm$^{2}$ by implementing wafer-scale MAPS bent into cylindrical half layers. To address these challenging requirements, the ALICE ITS3 project, in conjunction with the CERN EP R&D on monolithic pixel sensors, proposed the Tower Partners Semiconductor Co. 65 nm CMOS process as the starting point for the sensor. After the initial results confirmed the detection efficiency and radiation hardness, the choice of the technology was solidified by demonstrating the feasibility of operating MAPS in low-power consumption regimes, < 50 mW/cm$^{2}$, while maintaining high-quality performance. This was shown through a detailed characterisation of the Digital Pixel Test Structure (DPTS) prototype exposed to X-rays and ionising beams, and the results are presented in this article. Additionally, the sensor was further investigated through studies of the fake-hit rate, the linearity of the front-end in the range 1.7-28 keV, the performance after ionising irradiation, and the detection efficiency of inclined tracks in the range 0-45$^\circ$.

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Gianluca Aglieri Rinella, Nicole Apadula, Anton Andronic, Matias Antonelli, Mauro Aresti, Roberto Baccomi, Pascal Becht, Stefania Beole, Marcello Borri, Justus Braach, Matthew Daniel Buckland, Eric Buschmann, Paolo Camerini, Francesca Carnesecchi, Leonardo Cecconi, Edoardo Charbon, Giacomo Contin, Dominik Dannheim, Joao de Melo, Wenjing Deng, Antonello di Mauro, Jan Hasenbichler, Hartmut Hillemanns, Geun Hee Hong, Artem Isakov, Hangil Jang, Antoine Junique, Minjung Kim, Alex Kluge, Artem Kotliarov, Filip Křížek, Lukas Lautner, Sanghoon Lim, Magnus Mager, Davide Marras, Paolo Martinengo, Silvia Masciocchi, Marius Wilm Menzel, Magdalena Munker, Francesco Piro, Alexandre Rachevski, Karoliina Rebane, Felix Reidt, Roberto Russo, Isabella Sanna, Valerio Sarritzu, Serhiy Senyukov, Walter Snoeys, Jory Sonneveld, Miljenko Šuljić, Peter Svihra, Nicolas Tiltmann, Vittorio Di Trapani, Gianluca Usai, Jacob Bastiaan Van Beelen, Mirella Dimitrova Vassilev, Caterina Vernieri, Anna Villani. 2025-05-09. Further Characterisation of Digital Pixel Test Structures Implemented in a 65 nm CMOS Process. https://arxiv.org/abs/2505.05867

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